The optical and electrical characteristics of ZnO /MoS2 transparent oxide composite films
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Date
2021
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Kadir Has Üniversitesi
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Abstract
Optoelektronikte saydam iletken oksit kullanımı, verimliliği düşürmeden veya maliyeti artırmadan esneklik, dayanıklılık ve taşınabilirlik becerisinin elde edildiği bir devrim yaratmaktadır. ZnO / MoS2 saydam iletken kompozit filmi basit bir süreç oluşu ve düşük maliyeti nedeniyle en önemli yöntem olarak kabul edilen sol-jel yöntemi ile üretilmiştir. ZnO / MoS2'nin kristal yapı özellikleri, X-Işını kırınım modeli (XRD) ile karakterize edilmiştir. XRD spektroskopisi ile, farklı miktarlarda MoS2 katkılı ZnO filminin kristal boyutu tayin edilmiştir. UV- görünür bölge absorpsiyon spektrometresi, filmin spektroskopik analizini gerçekleştirmek için kullanılmıştır. Absorpsiyon eğrisinin altındaki alan ve yarı maksimum absorbans verilerinin tam genişliği hesaplanmıştır. Bu değerle kullanılarak en iyi katkı maddesi dağılımı için MoS2 miktarı tespit edilmiştir. Ayrıca, en iyi saydam iletken malzemeyi belirlemek üzere, dört nokta prob yöntemi kullanılarak elde edilen direnç değerleri farklı MoS2 katkı miktarları için kıyaslanmıştır. Bu çalışmada, bir ZnO / MoS2 saydam iletken oksit filmin optik ve elektrik karakterizasyonlarını incelenmiştir.
The use of transparent conductive oxide in optoelectronics creates a revolution where new generation materials with high transmittance and low sheet resistance value, durability and portability are achieved without decreasing efficiency or increasing cost. ZnO / MoS2 transparent conductive composite films was produced by the sol-gel method, which is considered the most important method due to its simple process and low cost. The crystal structure properties of ZnO / MoS2 have been characterized by the X-Ray diffraction pattern (XRD). The crystal size of ZnO film doped with different amounts of MoS2 was determined by XRD spectroscopy. UV-visible absorption spectrometer was used to perform spectroscopic analysis of the film. The area under the absorption curve and the full width of the half maximal absorbance data were calculated. Using this value, MoS2 amount was determined for the best additive distribution. In addition, in order to determine the best transparent conductive material, the resistance values obtained by using the four-point probe method were compared for different MoS2 additive amounts. The optical and electrical characterizations of ZnO / MoS2 transparent conductive oxide film were investigated.
The use of transparent conductive oxide in optoelectronics creates a revolution where new generation materials with high transmittance and low sheet resistance value, durability and portability are achieved without decreasing efficiency or increasing cost. ZnO / MoS2 transparent conductive composite films was produced by the sol-gel method, which is considered the most important method due to its simple process and low cost. The crystal structure properties of ZnO / MoS2 have been characterized by the X-Ray diffraction pattern (XRD). The crystal size of ZnO film doped with different amounts of MoS2 was determined by XRD spectroscopy. UV-visible absorption spectrometer was used to perform spectroscopic analysis of the film. The area under the absorption curve and the full width of the half maximal absorbance data were calculated. Using this value, MoS2 amount was determined for the best additive distribution. In addition, in order to determine the best transparent conductive material, the resistance values obtained by using the four-point probe method were compared for different MoS2 additive amounts. The optical and electrical characterizations of ZnO / MoS2 transparent conductive oxide film were investigated.
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Elektrik ve Elektronik Mühendisliği, Electrical and Electronics Engineering